2KW1

Solution structure of CTD

SOLUTION NMR

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NMR Experiment
Experiment	Type	Sample Contents	Solvent	Ionic Strength	pH	Pressure	Temperature (K)	Spectrometer
1	2D 1H-15N HSQC	10mM HEPES; 50mM sodium chloride; 5mM DTT; 10% D2O; 0.01% DSS; 90% H2O/10% D2O	90% H2O/10% D2O		7.0	ambient	298
2	2D 1H-13C HSQC	10mM HEPES; 50mM sodium chloride; 5mM DTT; 10% D2O; 0.01% DSS; 90% H2O/10% D2O	90% H2O/10% D2O		7.0	ambient	298
3	3D CBCA(CO)NH	10mM HEPES; 50mM sodium chloride; 5mM DTT; 10% D2O; 0.01% DSS; 90% H2O/10% D2O	90% H2O/10% D2O		7.0	ambient	298
4	3D C(CO)NH	10mM HEPES; 50mM sodium chloride; 5mM DTT; 10% D2O; 0.01% DSS; 90% H2O/10% D2O	90% H2O/10% D2O		7.0	ambient	298
5	3D HNCO	10mM HEPES; 50mM sodium chloride; 5mM DTT; 10% D2O; 0.01% DSS; 90% H2O/10% D2O	90% H2O/10% D2O		7.0	ambient	298
6	3D HBHA(CO)NH	10mM HEPES; 50mM sodium chloride; 5mM DTT; 10% D2O; 0.01% DSS; 90% H2O/10% D2O	90% H2O/10% D2O		7.0	ambient	298
7	3D H(CCO)NH	10mM HEPES; 50mM sodium chloride; 5mM DTT; 10% D2O; 0.01% DSS; 90% H2O/10% D2O	90% H2O/10% D2O		7.0	ambient	298
8	3D HCCH-TOCSY	10mM HEPES; 50mM sodium chloride; 5mM DTT; 10% D2O; 0.01% DSS; 90% H2O/10% D2O	90% H2O/10% D2O		7.0	ambient	298
9	3D 1H-15N NOESY	10mM HEPES; 50mM sodium chloride; 5mM DTT; 10% D2O; 0.01% DSS; 90% H2O/10% D2O	90% H2O/10% D2O		7.0	ambient	298
10	3D 1H-13C NOESY	10mM HEPES; 50mM sodium chloride; 5mM DTT; 10% D2O; 0.01% DSS; 90% H2O/10% D2O	90% H2O/10% D2O		7.0	ambient	298
11	3D HCACO	10mM HEPES; 50mM sodium chloride; 5mM DTT; 10% D2O; 0.01% DSS; 90% H2O/10% D2O	90% H2O/10% D2O		7.0	ambient	298

NMR Spectrometer Information
Spectrometer	Manufacturer	Model	Field Strength
1	Bruker	AVANCE	600

NMR Refinement
Method	Details	Software
simulated annealing		Amber

NMR Ensemble Information
Conformer Selection Criteria	structures with the lowest energy
Conformers Calculated Total Number	100
Conformers Submitted Total Number	20
Representative Model	1 (lowest energy)

Computation: NMR Software
#	Classification	Version	Software Name	Author
1	refinement	Amber		Case, Darden, Cheatham, III, Simmerling, Wang, Duke, Luo, and Kollm